EXPOSURE METHOD AND EXPOSURE DEVICE

An objective of the present invention is to supplement the exposure without reducing positional accuracy, even in the case where there is an exposure head that cannot expose due to a problem or the like. An exposure method comprises the processes of: irradiating light with a first exposure pattern f...

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Bibliographic Details
Main Authors ISO DAISUKE, NAKAI KAZUHIRO
Format Patent
LanguageEnglish
Korean
Published 29.08.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:An objective of the present invention is to supplement the exposure without reducing positional accuracy, even in the case where there is an exposure head that cannot expose due to a problem or the like. An exposure method comprises the processes of: irradiating light with a first exposure pattern from the first exposure head toward the first exposure area; irradiating light with a second exposure pattern from the first exposure head toward the second exposure area; irradiating light with a third exposure pattern from the second exposure head toward the third exposure area; and irradiating light with a fourth exposure pattern from the second exposure head toward the fourth exposure area. (과제) 문제 등에 의해 노광할 수 없는 노광 헤드가 있는 경우여도, 위치 정밀도를 저하시키지 않고 노광을 보충한다. (해결 수단) 노광 방법은, 제 1 노광 헤드로부터 제 1 노광 영역을 향하여 제 1 노광 패턴으로 광을 조사하는 공정과, 제 1 노광 헤드로부터 제 2 노광 영역을 향하여 제 2 노광 패턴으로 광을 조사하는 공정과, 제 2 노광 헤드로부터 제 3 노광 영역을 향하여 제 3 노광 패턴으로 광을 조사하는 공정과, 제 2 노광 헤드로부터 제 4 노광 영역을 향하여 제 4 노광 패턴으로 광을 조사하는 공정을 구비한다.
Bibliography:Application Number: KR20220176271