Phase Shift Blankmask and Photomask using the Flat Panel Display

A phase shift blank mask for a flat panel display (FPD) according to the present invention is provided with a phase shift film including a transmission shift control layer and a phase shift layer sequentially provided on a transparent substrate. The phase shift film has a transmittance deviation of...

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Bibliographic Details
Main Authors KIM DONG GEUN, KANG DONG SHIK, LEE JONG MIN, JEON YOUNG JO, GONG JONG GYU
Format Patent
LanguageEnglish
Korean
Published 29.08.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A phase shift blank mask for a flat panel display (FPD) according to the present invention is provided with a phase shift film including a transmission shift control layer and a phase shift layer sequentially provided on a transparent substrate. The phase shift film has a transmittance deviation of 4 % or less for each wavelength with respect to exposure light in a deep ultraviolet (DUV) region of 248 to 380 nm. Therefore, the phase shift blank mask and photomask for an FPD according to the present invention can be used in manufacturing high-resolution displays. 본 발명에 따른 FPD용 위상반전 블랭크 마스크는, 투명 기판 상에 순차적으로 구비된 투과변이 제어층 및 위상반전층을 포함하는 위상반전막이 구비되며, 상기 위상반전막은 248㎚ ∼ 380㎚의 Deep Ultraviolet(DUV) 영역 파장의 노광광에 대하여 각 파장별로 4% 이하의 투과율 편차를 갖다. 따라서, 본 발명에 따른 FPD용 위상반전 블랭크 마스크 및 포토마스크는 고해상도 디스플레이 제작에 사용 가능하다.
Bibliography:Application Number: KR20220022333