ETCHING SOLUTION COMPOSITION FOR SILVER-CONTAINING LAYER AND MANUFACTURING METHOD FOR AN ARRAY SUBSTRATE FOR DISPLAY DEVICE USING THE SAME

• Main Authors: SHIM KYUNG BO, LEE SEUNG SOO, JANG SANG HOON, NAM GI YONG, PARK YOUNG CHUL
• Format: Patent
• Language: English; Korean
• Published: 10.08.2023
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMISTRY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PAINTS; PHYSICS; POLISHES; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SEMICONDUCTOR DEVICES; SKI WAXES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

The present invention relates to an etchant composition for a silver-containing thin film, comprising: 5.0 to 48.0 wt% of phosphoric acid; 2.0 to 9.0 wt% of nitric acid; 5.0 to 15.0 wt% of acetic acid; 0.1 to 5.0 wt% of ferric nitrate; and a residual amount of water, and to a manufacturing method of an array substrate for a display device using the same. When etching metal films containing silver, side etch (S/E) is excellent. 본 발명은 인산 5.0 내지 48.0 중량%; 질산 2.0 내지 9.0 중량 %; 아세트산 5.0 내지 15.0 중량%; 질산제이철 0.1 내지 5.0 중량%; 및 잔량의 물을 포함하는 은 함유 박막의 식각액 조성물 및 이를 이용한 표시장치용 어레이기판의 제조방법을 제공한다.