노즐, 현상 장치 및 피처리체의 가공 방법

• Main Authors: KANDA SHINJI, SHIBUYA NORIHITO
• Format: Patent
• Language: Korean
• Published: 01.08.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; NOZZLES; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

일 형태에서는, 피처리체에 처리액을 분사하는 노즐이 제공된다. 이 노즐은, 중심축선을 가지는 케이스와, 케이스 내에 처리액을 공급하는 액공급구와, 케이스 내에 압축 기체를 공급하는 기체 공급구와, 처리액을 압축 기체와 함께 분사하는 분사구를 구비하며, 분사구는 중심축선을 중심으로 하는 링 형상을 가진다. In one aspect, a nozzle for injecting a processing liquid is provided. The nozzle includes a cylindrical housing having a central axis, a liquid supply port to supply the processing liquid into the housing, a gas supply port to supply a compressed gas into the housing, and an injection port to inject the processing liquid together with the compressed gas, and the injection port has an annular shape extending around the central axis.