Layer deposition apparatus having exhaust ports for multi-stage substrates

• Main Authors: KIM SANG YEOP, CHEON MIN HO, SEO DONG WON
• Format: Patent
• Language: English; Korean
• Published: 18.07.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention relates to a layer deposition apparatus having an exhaust port structure for a multi-stage substrate, which may relieve a lack of uniformity of the temperature and pressure of exhaust gas emitted from an exhaust port from each stage. The layer deposition apparatus comprises: a...