Layer deposition apparatus having multi-stage heaters and layer deposition method using the same

The present invention relates to a thin film deposition apparatus equipped with a multi-stage heater and a thin film deposition method using the same. The multi-stage thin film deposition apparatus comprises: a chamber for processing a plurality of substrates; a plurality of heater members arranged...

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Bibliographic Details
Main Authors KIM SANG BO, WOO RAM, LEE JIN HWAN, LEE SEUNG JUN, CHEON MIN HO
Format Patent
LanguageEnglish
Korean
Published 07.07.2023
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Summary:The present invention relates to a thin film deposition apparatus equipped with a multi-stage heater and a thin film deposition method using the same. The multi-stage thin film deposition apparatus comprises: a chamber for processing a plurality of substrates; a plurality of heater members arranged to correspond to lower parts of each of the plurality of substrates to heat the plurality of substrates; a lift pin penetrating each of the plurality of heater members and supporting a plurality of lower surfaces while being lifted up and down; a plurality of heat shield plates on which a lower end of the lift pin can be seated and which have a heat shield function between the plurality of heater members; and a plurality of support columns which support the plurality of heater members while integrally combining the same. Provided is the thin film deposition apparatus which provides stable substrate support. 다단 박막 증착 장치는, 복수의 기판을 처리하는 챔버와, 상기 복수의 기판 각각의 하부에 대응하도록 배치되어 상기 복수의 기판을 가열하는 복수의 히터부재와, 상기 복수의 히터부재 각각을 관통하여 승강하면서 상기 복수의 하면을 지지하는 리프트핀과, 상기 리프트핀의 하단이 안착될 수 있고 상기 복수의 히터부재 사이의 열차폐 기능을 갖는 복수의 열차폐판과, 상기 복수의 히터부재를 일체로 결합하면서 지지하는 복수의 지지 칼럼으로 이루어진다.
Bibliography:Application Number: KR20210194446