Manufacturing method of porous silica having high surface area under room temperature reaction

The present invention provides a method of manufacturing porous silica having a high specific surface area under room temperature reaction. The method comprises: a step (a) of adding a sodium silicate solution as a silica precursor to distilled water and stirring the sodium silicate solution and the...

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Bibliographic Details
Main Authors BAE JAE YOUNG, LEE JONG TAK, KIM MIN KYOUNG
Format Patent
LanguageEnglish
Korean
Published 03.07.2023
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Summary:The present invention provides a method of manufacturing porous silica having a high specific surface area under room temperature reaction. The method comprises: a step (a) of adding a sodium silicate solution as a silica precursor to distilled water and stirring the sodium silicate solution and the distilled water; a step (b) of adding a surfactant to the sodium silicate solution formed in the step (a) and stirring the surfactant and sodium silicate solution; a step (c) of adding an acidic solution to the surfactant-added solution formed in the step (b) and stirring the acidic solution and surfactant-added solution to adjust pH; and a step (d) of synthesizing porous silica through room temperature reaction, filtration, and then a washing step for a predetermined period of time. 본 발명은, (a) 증류수에 실리카 전구체로 물유리(sodium silicate solution)를 첨가하여 교반하는 단계; (b) 상기 (a) 단계에서 형성한 물유리 용액에 계면활성제를 첨가하고 교반하는 단계; (c) 상기 (b) 단계에서 형성한 계면활성제 첨가 용액에 산성용액을 첨가하고 교반하여 PH 조절하는 단계; 및 (d) 소정시간 동안 상온 반응과 여과 후 세척단계를 거쳐 다공성 실리카를 합성하는 단계를 포함하는 다공성 실리카 제조방법 및 이를 통해 제조된 다공성 실리카를 제공한다.
Bibliography:Application Number: KR20210186853