CLEANING LIQUID USED FOR CLEANING METAL RESISTS AND CLEANING METHOD USING CLEANING LIQUID

• Main Authors: KUMAGAI TOMOYA, SUGAWARA MAI
• Format: Patent
• Language: English; Korean
• Published: 21.06.2023
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; APPARATUS SPECIALLY ADAPTED THEREFOR; CANDLES; CHEMISTRY; CINEMATOGRAPHY; DETERGENT COMPOSITIONS; DETERGENTS; ELECTROGRAPHY; FATTY ACIDS THEREFROM; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; RECOVERY OF GLYCEROL; RESIN SOAPS; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

The present invention relates to a cleaning solution used for cleaning a metal resist. More specifically, the present invention relates to a cleaning solution including a solvent and a strong acid that is liquid at 20 deg. C, and having a pH value of 2.5 or less as measured by a pH meter, which is a solution obtained by diluting the cleaning solution 10 times with pure water. According to the present invention, removal of a metal is improved and the amount of residual organic matter is reduced. 금속 레지스트를 세정하기 위해서 사용되는 세정액으로서, 용제와 20 ℃ 에서 액체인 강산을 함유하고, 상기 세정액을 순수로 10 배로 희석한 액의, pH 미터로 측정한 pH 값이 2.5 이하인 세정액.