Anti-static blank mask and photo mask and manufacturing method for the same

• Main Authors: HUR IK BOUM, CHOI SANG SOO, KIM MYUNG YOUNG
• Format: Patent
• Language: English; Korean
• Published: 19.06.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

Disclosed are an anti-static blank mask and photo mask, and a method for manufacturing the same. The photomask comprises a substrate; and a light-shielding layer, wherein the light-shielding layer includes a light-shielding film present on the substrate and an anti-reflection film existing on the light-shielding film, the light-shielding film is composed of a material containing Cr or MoSi as a main ingredient, and the content ratio of the main ingredient to increase the electrical resistance is less than 80%. 정전기 방지용 블랭크 마스크와 포토 마스크 및 그 제조 방법이 개시된다. 포토 마스크는 기판; 및 차광층;을 포함하고, 차광층은 기판 위에 존재하는 차광막과 차광막 위에 존재하는 반사방지막을 포함하며, 차광막은 Cr 또는 MoSi를 주성분으로 하는 물질로 구성되고 전기저항을 크게 하기 위하여 주성분의 함량비는 80% 이하로 구성한다.