Etchant composition for polyimide material

• Main Authors: LIM YOUNG MIN, HUH YEON, KIM MIN WOO, YOO JUNG HUN, WOO SANG WOO
• Format: Patent
• Language: English; Korean
• Published: 07.06.2023
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CHEMISTRY; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; POLISHES; PRINTED CIRCUITS; SEMICONDUCTOR DEVICES

The present invention relates to a polyimide etchant composition comprising an alkali metal hydroxide aqueous solution, an amine compound, a hydrazine derivative, an etching accelerator, and purified water, wherein the polyimide etchant composition of the present invention has a high degree of saturation, can etch specimens of a larger area than conventional polyimide etchant compositions, leaves no residues after completing etching, and does not contain toxic substances to be safer for human body and environment. 본 발명은, 알칼리 금속 수산화물 수용액, 아민 화합물, 히드라진 유도체, 식각 촉진제 및 정제수를 포함하는 폴리이미드 식각액 조성물에 관한 것으로, 본 발명의 폴리이미드 식각액 조성물은 포화도가 높아, 종래의 폴리이미드 식각액 조성물보다 더 넓은 면적의 시편을 식각할 수 있고, 에칭을 완료한 뒤의 잔여물이 발생하지 않으며, 독성 물질이 포함되지 않아 인체 및 환경에 보다 안전한 장점이 있다.