WAVEFRONT MEASURING DEVICE USING LAYER SHEAR AND WAVEFRONT MEASURING METHOD USING THE SAME

According to a device for measuring the wavefront of light according to one embodiment of the present invention and a measuring method using the same, the layer shedding of light is measured by using a polarization grid and a polarization camera, and the wavefront can be measured through the layer s...

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Bibliographic Details
Main Authors JEONG HYO BIN, JOO KI NAM, PARK HYO MI
Format Patent
LanguageEnglish
Korean
Published 31.05.2023
Subjects
COLORIMETRY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT
MEASURING
PHYSICS
RADIATION PYROMETRY
TESTING
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Summary:According to a device for measuring the wavefront of light according to one embodiment of the present invention and a measuring method using the same, the layer shedding of light is measured by using a polarization grid and a polarization camera, and the wavefront can be measured through the layer shedding of the measured light. The wavefront measurement device includes a light providing unit, a light splitter, a plurality of polarization grating modules, and an optical detection unit. 본 발명의 일 실시 예에 따른 광의 파면을 측정하기 위한 장치 및 이를 이용한 측정 방법 따르면 편광격자 와 편광 카메라를 이용하여 광의 층밀림을 측정하고, 측정한 광의 층밀림을 통해 파면을 측정할 수 있게 된다.
Bibliography:Application Number: KR20210162336