WAVEFRONT MEASURING DEVICE USING LAYER SHEAR AND WAVEFRONT MEASURING METHOD USING THE SAME
According to a device for measuring the wavefront of light according to one embodiment of the present invention and a measuring method using the same, the layer shedding of light is measured by using a polarization grid and a polarization camera, and the wavefront can be measured through the layer s...
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Main Authors | , , |
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Format | Patent |
Language | English Korean |
Published |
31.05.2023
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Subjects | |
Online Access | Get full text |
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Summary: | According to a device for measuring the wavefront of light according to one embodiment of the present invention and a measuring method using the same, the layer shedding of light is measured by using a polarization grid and a polarization camera, and the wavefront can be measured through the layer shedding of the measured light. The wavefront measurement device includes a light providing unit, a light splitter, a plurality of polarization grating modules, and an optical detection unit.
본 발명의 일 실시 예에 따른 광의 파면을 측정하기 위한 장치 및 이를 이용한 측정 방법 따르면 편광격자 와 편광 카메라를 이용하여 광의 층밀림을 측정하고, 측정한 광의 층밀림을 통해 파면을 측정할 수 있게 된다. |
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Bibliography: | Application Number: KR20210162336 |