COMPOUND PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME AND COLOR FILTER

• Main Authors: JANG CHUNKEUN, CHOI KYUBUEM, JEON GWANGIL, MOON HEEJO, SHIN INSUB, KWON CHANG HYUN
• Format: Patent
• Language: English; Korean
• Published: 08.05.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HETEROCYCLIC COMPOUNDS; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS

A compound represented by chemical formula 1, a photosensitive resin composition containing the compound, and a color filter manufactured by using the photosensitive resin composition are provided. In the chemical formula 1, each substituent is as defined in the present specification. 하기 화학식 1로 표시되는 화합물, 상기 화합물을 포함하는 감광성 수지 조성물 및 상기 감광성 수지 조성물을 이용하여 제조되는 컬러필터가 제공된다. [화학식 1] TIFFpat00064.tif71126 (상기 화학식 1에서, 각 치환기는 명세서에 정의된 바와 같다.)