CHEMICAL LIQUID AND PROCESSING METHOD

• Main Authors: SHIGENOI YUTA, MIZUTANI ATSUSHI
• Format: Patent
• Language: English; Korean
• Published: 31.03.2023
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMISTRY; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; POLISHES; SEMICONDUCTOR DEVICES

Provided are a chemical liquid having an excellent etching ability of an Al oxide, an excellent inhibition of an Ga oxide, and an excellent etching selectivity of the Al oxide with respect to the Ga oxide; and a treatment method using the chemical liquid. The chemical liquid comprising: phosphoric a...