MONOALKYL TIN TRIALKOXIDES AND/OR MONOALKYL TIN TRIAMIDES WITH PARTICULATE CONTAMINATION AND CORRESPONDING METHODS

Purification of monoalkyl tin trialkoxides and monoalkyl tin triamides using fractional distillation and/or ultrafiltration is described. A purified composition is useful as a radiation-sensitive patterning composition or a precursor thereof. A fractional distillation process has been found to be ef...

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Bibliographic Details
Main Authors GATES CRAIG M, CLARK BENJAMIN L, SMIDDY DOMINICK, GENIZA MARK
Format Patent
LanguageEnglish
Korean
Published 28.03.2023
Subjects
ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM
CHEMISTRY
METALLURGY
ORGANIC CHEMISTRY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
SEPARATION
TRANSPORTING
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Summary:Purification of monoalkyl tin trialkoxides and monoalkyl tin triamides using fractional distillation and/or ultrafiltration is described. A purified composition is useful as a radiation-sensitive patterning composition or a precursor thereof. A fractional distillation process has been found to be effective in removing metal impurities to very low levels. An ultrafiltration process has been found to be effective in removing fine particulates. Commercially viable processing techniques are described. 분별 증류 및/또는 한외 여과를 사용하는 모노알킬 주석 트리알콕사이드 및 모노알킬 주석 트리아미드의 정제가 기술된다. 정제된 조성물은 방사선 감응형 패터닝 조성물 또는 이의 전구체로서 유용하다. 분별 증류 공정은 금속 불순물을 매우 낮은 수준으로 제거하는데 효과적인 것으로 밝혀졌다. 한외 여과 공정은 미세 미립자의 제거에 효과적인 것으로 밝혀졌다. 상업적으로 실용적인 프로세싱 기술이 기술된다.
Bibliography:Application Number: KR20230037007