SUBSTRATE PROCESSING APPARATUS TREATMENT SOLUTION SUPPLY APPARATUS

• Main Authors: KIM HAE KYUNG, PARK HYUNG MIN, LEE JUNG JIN, PIAO LIN FENG, LEE JU BEOM, KIM DAE SUNG, JUNG WOO SIN, CHO A RAH, GOH JUNG SUK
• Format: Patent
• Language: English; Korean
• Published: 09.03.2023
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

A treatment liquid supply apparatus is provided. The treatment liquid supply apparatus includes: a storage container in which a treatment liquid is stored; an air trap for removing bubbles from the treatment liquid supplied from the storage container; and a supply pipe connecting the storage container and the air trap. A portion of the supply pipe may be lower than the storage container. Therefore, it is possible to minimize a backflow area on a treatment liquid supply line. 본 발명은 처리액 공급 장치를 제공한다. 처리액 공급 장치는 처리액이 저장되어 있는 저장용기; 상기 저장용기로부터 공급받은 처리액으로부터 버블을 제거하는 에어 트랩; 및 상기 저장 용기와 상기 에어 트랩을 연결하는 공급배관을 포함하되; 상기 공급배관은 일부 구간이 상기 저장 용기보다 낮게 제공될 수 있다.