연마입자의 제조방법, 화학기계 연마용 조성물 및 화학기계 연마방법

• Main Authors: YAMADA YUUYA, WANG PENGYU, BABA ATSUSHI, YANAGI TAKANORI, NAKANISHI KOUJI
• Format: Patent
• Language: Korean
• Published: 03.03.2023
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMISTRY; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; POLISHES; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SEMICONDUCTOR DEVICES; SKI WAXES

실리콘 산화막뿐만 아니라 비정질 실리콘막이나 폴리실리콘막에 대해서도 실리콘 질화막을 선택적으로 연마하기 위한 연마입자이나 화학기계 연마용 조성물을 제공한다. 본 발명에 관한 연마입자의 제조방법은 설파닐기(-SH)가 공유결합을 통해 표면에 고정화된 입자와, 탄소-탄소 불포화 이중 결합을 갖는 화합물을 함유하는 혼합물을 가열하는 제1 공정과, 상기 제1 공정 후, 과산화물을 더 첨가하여 가열하는 제2 공정을 포함한다. Provided are abrasive grains and a composition for chemical mechanical polishing which are for selectively polishing a silicon nitride film, and which are applicable not only to silicon oxide films but also to amorphous silicon films and polysilicon films. This method for manufacturing abrasive grains includes: a first step of heating a mixture which contains particles having a sulfanyl group (-SH) fixed to the surface thereof via covalent bonds, and which contains a compound having carbon-carbon unsaturated double bonds; and a second step, which is performed after the first step, of further adding a peroxide and carrying out heating.