Semiconductor device and method for fabricating the same

Provided is a semiconductor device. The semiconductor device comprises: a substrate; a first interlayer insulating film arranged on the substrate; a first wiring pattern arranged inside a first trench formed on the first interlayer insulating film; a second interlayer insulating film arranged on the...

Full description

Saved in:
Bibliographic Details
Main Authors JANG HAN MIN, NOH SUN YOUNG, LEE EUI BOK, KIM WAN DON
Format Patent
LanguageEnglish
Korean
Published 30.01.2023
Subjects
Online AccessGet full text

Cover

Loading…