Semiconductor device and method for fabricating the same
Provided is a semiconductor device. The semiconductor device comprises: a substrate; a first interlayer insulating film arranged on the substrate; a first wiring pattern arranged inside a first trench formed on the first interlayer insulating film; a second interlayer insulating film arranged on the...
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Main Authors | , , , |
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Format | Patent |
Language | English Korean |
Published |
30.01.2023
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Subjects | |
Online Access | Get full text |
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