COMPOSITION FOR REMOVING EDGE BEAD FROM METAL CONTAINING RESISTS AND METHOD OF FORMING PATTERNS INCOUDING STEP OF REMOVING EDGE BEAD USING THE COMPOSITION
Provided are: a composition for removing an edge bead of a metal-containing resist, comprising an organic solvent and a cyclic compound substituted with at least one hydroxyl group (-OH), wherein the number of carbon atoms of the cyclic compound is 5 to 30, and the cyclic compound has at least one d...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English Korean |
Published |
17.01.2023
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Subjects | |
Online Access | Get full text |
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Summary: | Provided are: a composition for removing an edge bead of a metal-containing resist, comprising an organic solvent and a cyclic compound substituted with at least one hydroxyl group (-OH), wherein the number of carbon atoms of the cyclic compound is 5 to 30, and the cyclic compound has at least one double bond in the ring; and a method for forming a pattern, comprising a step of removing the edge bead by using same.
유기 용매, 그리고 적어도 하나의 하이드록시기 (-OH)로 치환된, 고리형 화합물을 포함하고, 상기 고리형 화합물의 탄소수는 5 내지 30이며, 상기 고리형 화합물은 고리 내에 적어도 1개의 이중 결합을 갖는 것인, 금속 함유 레지스트의 에지 비드 제거용 조성물, 및 이를 이용한 에지 비드 제거 단계를 포함하는 패턴 형성 방법을 제공한다. |
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Bibliography: | Application Number: KR20220061047 |