ORGANO TIN COMPOUND FOR THIN FILM DEPOSITION AND METHOD OF FORMING TIN CONTAINING THIN FILM USING THE SAME

• Main Authors: LEE TAE YOUNG, KIM SHIN BEOM, TAEHWAN LIM, SANGHYUN LEE, SUPILL CHUN, BAIK SUN YOUNG, DONGKYUN LEE, SIM JANG KEUN, JI SUNG JUN
• Format: Patent
• Language: English; Korean
• Published: 26.12.2022
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; ORGANIC CHEMISTRY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

According to an embodiment of the present invention, the organotin compound is represented by Formula 1 below. [Formula 1] In Formula 1, L_1 and L_2 are each independently selected from an alkoxy group having 1 to 10 carbon atoms and an alkylamino group having 1 to 10 carbon atoms, R_1 is a substitu...