ORGANO TIN COMPOUND FOR THIN FILM DEPOSITION AND METHOD OF FORMING TIN CONTAINING THIN FILM USING THE SAME
According to an embodiment of the present invention, the organotin compound is represented by Formula 1 below. [Formula 1] In Formula 1, L_1 and L_2 are each independently selected from an alkoxy group having 1 to 10 carbon atoms and an alkylamino group having 1 to 10 carbon atoms, R_1 is a substitu...
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Main Authors | , , , , , , , , |
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Format | Patent |
Language | English Korean |
Published |
26.12.2022
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Subjects | |
Online Access | Get full text |
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Summary: | According to an embodiment of the present invention, the organotin compound is represented by Formula 1 below. [Formula 1] In Formula 1, L_1 and L_2 are each independently selected from an alkoxy group having 1 to 10 carbon atoms and an alkylamino group having 1 to 10 carbon atoms, R_1 is a substituted or unsubstituted aryl group having 6 to 8 carbon atoms, and R_2 is a substituted or an unsubstituted linear alkyl group having 1 to 4 carbon atoms, a branched alkyl group having 3 to 4 carbon atoms, a cyclic alkyl group having 3 to 6 carbon atoms, and an allyl group having 2 to 4 carbon atoms. The present invention is to provide a method for forming thin film for depositing a high-quality thin film using a precursor composition for thin film deposition.
본 발명의 실시예에 의하면, 유기 주석 화합물은 하기 화학식 1로 표시된다. [화학식 1] JPEGpat00008.jpg3436 상기 화학식 1에서, L1 및 L2는 각각 독립적으로 탄소수 1 내지 10의 알콕시기 및 탄소수 1 내지 10의 알킬아미노기 중에서 선택되고, R1은 치환 또는 비치환된 탄소수 6 내지 8의 아릴기이고, R2는 치환 또는 비치환된 탄소수 1 내지 4의 선형 알킬기, 탄소수 3 내지 4의 분지형 알킬기, 탄소수 3 내지 6의 고리형 알킬기 및 탄소수 2 내지 4의 알릴기 중에서 선택된다. |
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Bibliography: | Application Number: KR20210078817 |