SUBSTRATE PROCESSING APPARATUS

The purpose of the present invention is to provide a substrate processing device capable of easily performing maintenance of a processing container. The substrate processing device (3) includes a container body (311) which accommodates a substrate (W) and performs processing on the substrate (W) usi...

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Bibliographic Details
Main Authors OKAMURA SATOSHI, BIWA SATOSHI
Format Patent
LanguageEnglish
Korean
Published 15.12.2022
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The purpose of the present invention is to provide a substrate processing device capable of easily performing maintenance of a processing container. The substrate processing device (3) includes a container body (311) which accommodates a substrate (W) and performs processing on the substrate (W) using a high-pressure processing fluid, and a conveying port (312) for carrying in and out the substrate (W) inside the container body (311). An opening (321) is formed in a position different from that of the conveying port (312) in the container body (311). The opening (321) is blocked by a second cover member (322). 본 발명은 처리 용기의 메인터넌스 작업을 용이하게 행하는 것이 가능한, 기판 처리 장치를 제공하는 것을 목적으로 한다. 기판 처리 장치(3)는, 기판(W)을 수용하고, 기판(W)에 대해 고압의 처리 유체를 이용하여 처리를 행하는 용기 본체(311)와, 용기 본체(311) 내에 기판(W)을 반입 및 반출하기 위한 반송구(312)를 구비하고 있다. 용기 본체(311) 중, 반송구(312)와는 상이한 위치에 개구(321)가 형성되어 있다. 개구(321)는, 제2 덮개 부재(322)에 의해 막혀진다.
Bibliography:Application Number: KR20220160827