SUBSTRATE PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD

A substrate processing apparatus is to process a substrate, wherein the substrate processing apparatus comprises: a movable body capable of moving while holding the substrate; a measurement part measuring the position of the movable body by irradiating light; and a jetting part communicated with an...

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Bibliographic Details
Main Author SAEDA SHIN
Format Patent
LanguageEnglish
Korean
Published 22.11.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A substrate processing apparatus is to process a substrate, wherein the substrate processing apparatus comprises: a movable body capable of moving while holding the substrate; a measurement part measuring the position of the movable body by irradiating light; and a jetting part communicated with an air conditioner for supplying temperature-controlled gas, and the jetting part includes a first jetting part for supplying gas to a first area in which the movable body including an optical path of light is movable, a second jetting part for supplying gas to a second area communicating with the first area and a third jetting part for supplying gas to a gap between the first area and the second area. 기판 처리장치는, 기판을 처리하는 기판 처리장치로서, 기판을 유지한 상태에서 이동가능한 이동체와, 빛을 조사함으로써 이동체의 위치를 계측하는 계측부와, 온도조절된 기체를 공급하는 공조기에 연통된 분출부를 갖고, 분출부는, 빛의 광로를 포함하는 이동체가 이동가능한 제1 영역에 기체를 공급하는 제1 분출부와, 상기 제1 영역과 연통하는 제2 영역에 기체를 공급하는 제2 분출부와, 제1 영역과 제2 영역 사이에 기체를 공급하는 제3 분출부를 구비한다.
Bibliography:Application Number: KR20220040861