EVAPORATION SOURCE DEVICE AND VAPOR DEPOSITION APPARATUS

• Main Authors: KAZAMA YOSHIAKI, KONDO YOSHINARI
• Format: Patent
• Language: English; Korean
• Published: 21.11.2022
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention provides an evaporation source device capable of controlling a position of an opening through which a deposition material passes while suppressing a decrease in temperature. The evaporation source device includes: a container having an opening in which a deposition material is accommodated; a heating means for heating the container; and an accommodating member accommodating the container and the heating means. The accommodating member includes a container support part, a side part, and a positioning part. The container support part supports at least a part of an outer side of the bottom of the container. The positioning part is installed to protrude from the side part in a rod shape or a plate shape with respect to the container. [과제] 증발원 장치에 있어서, 온도의 저하를 억제하면서, 증착 재료가 통과하는 개구의 위치 제어를 행할 수 있는 증발원 장치를 제공한다. [해결 수단] 증착 재료가 수용되는, 개구를 가지는 용기와, 용기를 가열하는 가열 수단과, 용기와, 가열 수단을 수용하는 수용 부재를 가지는 증발원 장치로서, 수용 부재는, 용기 지지부와, 측면부와, 위치 결정부를 포함하고, 용기 지지부는, 용기의 저부의 외측의 적어도 일부를 지지하고, 위치 결정부는, 측면부로부터 용기에 대해서 봉상 또는 판상으로 돌출하여 설치되어 있는 것을 특징으로 하는 증발원 장치를 이용한다.