Apparatus for forming patterns

• Main Authors: BAE NAM SEOK, NAM YOON HO, SONG CHEOL OCK, HWANG JI YOUNG, JANG EUNG JIN, SEO HAN MIN, CHOI HANG SUK, LEE SEUNG HEON
• Format: Patent
• Language: English; Korean
• Published: 17.11.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; CLEANING; CLEANING IN GENERAL; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PREVENTION OF FOULING IN GENERAL; TRANSPORTING

The present invention relates to a pattern forming apparatus. According to one aspect of the present invention, provided is a pattern forming apparatus comprising: a first supply unit for supplying a substrate; a second supply unit supplying a mask to be positioned on the substrate in at least a portion of the transfer path of the substrate of the first supply unit, and forming a closed curve in the transfer path of the mask; and a light source configured to irradiate light toward the substrate through the mask. 본 발명은 패턴 성형 장치에 관한 것으로, 본 발명의 일 측면에 따르면, 기재를 공급하기 위한 제1 공급부; 제1 공급부의 기재의 이송 경로 상 적어도 일부 구간에서 기재 상에 위치되도록 마스크를 공급하며, 마스크의 이송 경로가 폐곡선을 형성하는 제2 공급부; 및 마스크를 통과하여 기재 측으로 광을 조사하도록 마련된 광원을 포함하는 패턴 성형 장치가 제공된다.