CHEMICAL SOLUTION AND METHOD FOR TREATING SUBSTRATE

본 발명은, 천이 금속 함유물에 대한 우수한 용해능을 갖고, 또한 피처리부의 우수한 평활성을 실현할 수 있는 약액, 및 이것을 이용한 처리 방법을 제공한다. 본 발명의 약액은, 기판 상의 천이 금속 함유물을 제거하기 위하여 이용되는 약액으로서, 과아이오딘산류와 IO3-, I-, 및 I3-으로 이루어지는 군으로부터 선택되는 1종 이상의 음이온을 포함하는 화합물을 포함하고, 음이온을 포함하는 화합물의 함유량이, 약액 전체 질량에 대하여, 5질량ppb~1질량%이다. The present invention provides a chemica...

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Main Authors TAKAHASHI TOMONORI, SEKI HIROYUKI, SUGIMURA NOBUAKI
Format Patent
LanguageEnglish
Korean
Published 14.11.2022
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Abstract 본 발명은, 천이 금속 함유물에 대한 우수한 용해능을 갖고, 또한 피처리부의 우수한 평활성을 실현할 수 있는 약액, 및 이것을 이용한 처리 방법을 제공한다. 본 발명의 약액은, 기판 상의 천이 금속 함유물을 제거하기 위하여 이용되는 약액으로서, 과아이오딘산류와 IO3-, I-, 및 I3-으로 이루어지는 군으로부터 선택되는 1종 이상의 음이온을 포함하는 화합물을 포함하고, 음이온을 포함하는 화합물의 함유량이, 약액 전체 질량에 대하여, 5질량ppb~1질량%이다. The present invention provides a chemical solution, which has an excellent dissolving ability for a transition metal-containing substance and can realize excellent smoothness of a portion to be treated, and a treatment method using the chemical solution. The chemical solution according to an embodiment of the present invention is a chemical solution used for removing a transition metal-containing substance on a substrate and includes periodic acids and a compound including one or more kinds of anions selected from the group consisting of IO3−, I−, and I3−, in which a content of the compound including anions with respect to a total mass of the chemical solution is 5 ppb by mass to 1% by mass.
AbstractList 본 발명은, 천이 금속 함유물에 대한 우수한 용해능을 갖고, 또한 피처리부의 우수한 평활성을 실현할 수 있는 약액, 및 이것을 이용한 처리 방법을 제공한다. 본 발명의 약액은, 기판 상의 천이 금속 함유물을 제거하기 위하여 이용되는 약액으로서, 과아이오딘산류와 IO3-, I-, 및 I3-으로 이루어지는 군으로부터 선택되는 1종 이상의 음이온을 포함하는 화합물을 포함하고, 음이온을 포함하는 화합물의 함유량이, 약액 전체 질량에 대하여, 5질량ppb~1질량%이다. The present invention provides a chemical solution, which has an excellent dissolving ability for a transition metal-containing substance and can realize excellent smoothness of a portion to be treated, and a treatment method using the chemical solution. The chemical solution according to an embodiment of the present invention is a chemical solution used for removing a transition metal-containing substance on a substrate and includes periodic acids and a compound including one or more kinds of anions selected from the group consisting of IO3−, I−, and I3−, in which a content of the compound including anions with respect to a total mass of the chemical solution is 5 ppb by mass to 1% by mass.
Author SEKI HIROYUKI
SUGIMURA NOBUAKI
TAKAHASHI TOMONORI
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Snippet 본 발명은, 천이 금속 함유물에 대한 우수한 용해능을 갖고, 또한 피처리부의 우수한 평활성을 실현할 수 있는 약액, 및 이것을 이용한 처리 방법을 제공한다. 본 발명의 약액은, 기판 상의 천이 금속 함유물을 제거하기 위하여 이용되는 약액으로서, 과아이오딘산류와 IO3-, I-, 및...
SourceID epo
SourceType Open Access Repository
SubjectTerms ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CANDLES
CHEMISTRY
CINEMATOGRAPHY
DETERGENT COMPOSITIONS
DETERGENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
FATTY ACIDS THEREFROM
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
RECOVERY OF GLYCEROL
RESIN SOAPS
SEMICONDUCTOR DEVICES
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
Title CHEMICAL SOLUTION AND METHOD FOR TREATING SUBSTRATE
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