CHEMICAL SOLUTION AND METHOD FOR TREATING SUBSTRATE

• Main Authors: TAKAHASHI TOMONORI, SEKI HIROYUKI, SUGIMURA NOBUAKI
• Format: Patent
• Language: English; Korean
• Published: 14.11.2022
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CANDLES; CHEMISTRY; CINEMATOGRAPHY; DETERGENT COMPOSITIONS; DETERGENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; FATTY ACIDS THEREFROM; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; RECOVERY OF GLYCEROL; RESIN SOAPS; SEMICONDUCTOR DEVICES; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

본 발명은, 천이 금속 함유물에 대한 우수한 용해능을 갖고, 또한 피처리부의 우수한 평활성을 실현할 수 있는 약액, 및 이것을 이용한 처리 방법을 제공한다. 본 발명의 약액은, 기판 상의 천이 금속 함유물을 제거하기 위하여 이용되는 약액으로서, 과아이오딘산류와 IO3-, I-, 및 I3-으로 이루어지는 군으로부터 선택되는 1종 이상의 음이온을 포함하는 화합물을 포함하고, 음이온을 포함하는 화합물의 함유량이, 약액 전체 질량에 대하여, 5질량ppb~1질량%이다. The present invention provides a chemical solution, which has an excellent dissolving ability for a transition metal-containing substance and can realize excellent smoothness of a portion to be treated, and a treatment method using the chemical solution. The chemical solution according to an embodiment of the present invention is a chemical solution used for removing a transition metal-containing substance on a substrate and includes periodic acids and a compound including one or more kinds of anions selected from the group consisting of IO3−, I−, and I3−, in which a content of the compound including anions with respect to a total mass of the chemical solution is 5 ppb by mass to 1% by mass.