레지스트 하층막 형성 조성물

• Main Authors: MIURA KATSUYA, KURAMOTO YUTARO, NAKAJIMA MAKOTO, TOKUNAGA HIKARU, HAMADA SATOSHI
• Format: Patent
• Language: Korean
• Published: 08.11.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

신규의 레지스트 하층막 형성 조성물을 제공한다. 메톡시메틸기와 메톡시메틸기 이외의 ROCH2-기(R은 1가의 유기기, 수소원자 또는 이들의 혼합이다)를 갖는 동일 또는 상이한 복수의 구조단위, 및 상기 복수의 구조단위를 연결하는 연결기를 포함하는 폴리머(X), 그리고 용제를 포함하는 레지스트 하층막 형성 조성물. Provided is a novel composition for forming a resist underlayer film. This composition for forming a resist underlayer film includes a polymer (X) and a solvent, the polymer (X) containing: a plurality of structural units which are the same as or different from each other and have a methoxymethyl group and a ROCH2- group (R is a monovalent organic group, a hydrogen atom, or a mixture thereof) other than the methoxymethyl group; and a linking group that links the more than one structural unit.