BLUE LIGHT BLOCKING FILM AND METHOD FOR MANUFACTURING THE SAME

Provided is a blue light blocking film, which includes a substrate and a photonic crystal pattern in which a plurality of photonic crystal particles are regularly arranged at intervals on the substrate. The photonic crystal particles include polymer particles and a coating layer having a band gap of...

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Bibliographic Details
Main Authors KIM JUNG YEON, PARK JUNGYEON, HONG WOONG PYO, CHO EUN CHUL, PYUN SEUNG BEOM
Format Patent
LanguageEnglish
Korean
Published 18.10.2022
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Summary:Provided is a blue light blocking film, which includes a substrate and a photonic crystal pattern in which a plurality of photonic crystal particles are regularly arranged at intervals on the substrate. The photonic crystal particles include polymer particles and a coating layer having a band gap of 2.5 eV or more on the surface of the polymer particles. 기판, 그리고 기판 위에 복수의 광결정 입자들이 간격을 두고 규칙적으로 배열된 광결정 패턴을 포함하며, 광결정 입자는, 고분자 입자, 및 상기 고분자 입자 표면에 밴드갭이 2.5 eV 이상인 코팅층을 포함하는, 청색광 차단 필름을 제공한다.
Bibliography:Application Number: KR20210046491