DOGBONE INLET CONE PROFILE FOR REMOTE PLASMA OXIDATION CHAMBER

• Main Authors: OLSEN CHRISTOPHER S, PANDEY VISHWAS KUMAR, SHONO ERIC KIHARA, RAJU HEMANTHA, TJANDRA AGUS SOFIAN, LO HANSEL, SHAH KARTIK
• Format: Patent
• Language: English; Korean
• Published: 17.10.2022
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

본 개시내용의 실시예들은 일반적으로, 고종횡비 구조들의 등각적 산화를 위한 처리 챔버에 관한 것이다. 처리 챔버는, 제1 측부 및 제1 측부에 대향하는 제2 측부를 갖는 챔버 몸체, 및 제1 측부에 배치되는 유동 조립체를 포함한다. 유동 조립체는, 처리 챔버의 처리 구역에 배치된 기판의 중심으로부터 멀어지게 유체 유동을 지향시키기 위한 유동 분할기를 포함한다. 유동 분할기는, 초승달 형상 제1 측부, 최상부, 및 최하부를 포함한다. 처리 챔버는 또한, 제2 측부에 인접하게 위치되는 분산형 펌핑 구조를 포함한다. 유동 조립체는, 라디칼들의 유동 협착을 감소시키도록 설계되어, 증가된 라디칼 농도 및 플럭스로 이어진다. Embodiments of the present disclosure generally relate to a processing chamber for conformal oxidation of high aspect ratio structures. The processing chamber includes a chamber body with a first side and a second side opposite the first side, and a flow assembly disposed in the first side. The flow assembly includes a flow divider to direct fluid flow away from a center of a substrate disposed in a processing region of the processing chamber. The flow divider includes a crescent shaped first side, a top, and a bottom. The processing chamber also includes a distributed pumping structure located adjacent to the second side. The flow assembly is designed to reduce flow constriction of the radicals, leading to increased radical concentration and flux.