EL EL EL NEGATIVE RADIATION-SENSITIVE RESIN COMPOSITION INSULATING FILM FOR ORGANIC EL ELEMENT AND FORMATION METHOD FOR SAME AND ORGANIC EL DEVICE
The present invention is to provide a negative-type radiation-sensitive resin composition which enables production of a cured film that has sufficient lithography performance and has sufficient chemical liquid resistance and oxygen ashing resistance even by heating at comparatively low temperature;...
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Main Authors | , , , , |
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Format | Patent |
Language | English Korean |
Published |
14.10.2022
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention is to provide a negative-type radiation-sensitive resin composition which enables production of a cured film that has sufficient lithography performance and has sufficient chemical liquid resistance and oxygen ashing resistance even by heating at comparatively low temperature; an insulating film for an organic EL element and an organic EL device, obtained by using the negative-type radiation-sensitive resin composition; and a method for forming the insulating film for an organic EL element using the negative-type radiation-sensitive resin composition. The negative-type radiation-sensitive resin composition contains (A) a polysiloxane having at least one thiol group, (B) a polyfunctional methacrylate, and (C) a photopolymerization initiator, and has a viscosity measured using an E type viscometer under conditions of 25 ℃ and 50 rpm of 0.5 0mPa·s or more and 20 0mPa·s or less.
(과제) 충분한 리소그래피 성능을 갖고, 비교적 저온의 가열에 의해서도 충분한 약액 내성 및 산소 애싱 내성을 갖는 경화막을 얻을 수 있는 네거티브형 감방사선성 수지 조성물, 상기 네거티브형 감방사선성 수지 조성물을 이용하여 얻어지는 유기 EL 소자용 절연막 및 유기 EL 장치, 그리고 상기 네거티브형 감방사선성 수지 조성물을 이용한 유기 EL 소자용 절연막의 형성 방법을 제공하는 것을 과제로 한다. (해결 수단) 본 발명은, (A) 적어도 1개의 티올기를 갖는 폴리실록산, (B) 다관능 메타크릴레이트 및, (C) 광 중합 개시제를 함유하고, E형 점도계를 이용하여, 25℃, 50rpm의 조건으로 측정한 점도가 0.5mPa·s 이상 20mPa·s 이하인 네거티브형 감방사선성 수지 조성물. |
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Bibliography: | Application Number: KR20220043012 |