Organometallic adduct compounds and method of manufacturing integrated circuit device using the same

• Main Authors: KOIDE TAKANORI, UCHIUZOU HIROYUKI, HARANO KAZUKI, PARK GYU HEE, TAKAHIRO YOSHII, FUSE WAKANA, CHO YOUN JOUNG, KIM JAE WOON, KIM YOUN SOO, AOKI YUTATO, RYU SEUNG MIN, SAITO KAZUYA, MANABE YOSHIKI, KIMURA MASAYUKI
• Format: Patent
• Language: English; Korean
• Published: 12.10.2022
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; ORGANIC CHEMISTRY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention relates to an organometallic adduct compound of formula (I) and a method of manufacturing an integrated circuit device using the same to form a metal-containing film on a substrate. [Formula (I)]. In formula (1), R^1, R^2, R^3, R^4, and R^5 are each independently a hydrogen atom, a halogen atom, a substituted or unsubstituted C1-C5 straight-chain alkyl group, a substituted or unsubstituted C3-C5 branched alkyl group, a substituted or unsubstituted C2-C5 straight-chain alkenyl group, or a substituted or unsubstituted C3-C5 branched alkenyl group, X is a halogen atom, and M is a niobium atom or a tantalum atom. 다음 일반식 (I)의 유기금속 부가 화합물 및 이를 사용하여 기판 위에 금속 함유막을 형성하는 집적회로 소자의 제조 방법을 개시한다. 일반식 (I) JPEGpat00084.jpg4878 일반식 (I)에서, R1, R2, R3, R4, 및 R5는 각각 독립적으로 수소 원자, 할로겐 원자, 치환 또는 비치환된 C1-C5의 직쇄형 알킬기, 치환 또는 비치환된 C3-C5의 분기형 알킬기, 치환 또는 비치환된 C2-C5의 직쇄형 알케닐기, 또는 치환 또는 비치환된 C3-C5의 분기형 알케닐기이고, X는 할로겐 원자이고, M은 니오븀 원자 또는 탄탈륨 원자임.