재료의 패터닝된 층을 형성하기 위한 방법 및 장치

• Main Authors: OVERKAMP JIM VINCENT, DE VRIES GOSSE CHARLES, CASTELLANOS ORTEGA SONIA, POLYAKOV ALEXEY OLEGOVICH, DRUZHININA TAMARA, COENEN TEIS JOHAN, KURGANOVA EVGENIA, LUGIER OLIVIER CHRISTIAN MAURICE
• Format: Patent
• Language: Korean
• Published: 05.10.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMICAL SURFACE TREATMENT; CHEMISTRY; CINEMATOGRAPHY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTROGRAPHY; HOLOGRAPHY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

재료의 패터닝된 층을 형성하기 위한 방법 및 장치가 개시된다. 한 배열체에서, 증착-공정 재료는 가스 형태로 제공된다. 증착-공정 재료의 층은 가스 증착-공정 재료의 응축 또는 증착을 야기함으로써 기판 상에 형성된다. 증착-공정 재료의 층의 선택된 부분은 조사되어 선택된 부분 내의 증착-공정 재료를 개질시킨다. Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a deposition-process material is provided in gaseous form. A layer of the deposition-process material is formed on the substrate by causing condensation or deposition of the gaseous deposition-process material. A selected portion of the layer of deposition-process material is irradiated to modify the deposition-process material in the selected portion.