Method for forming nanoporous gold on the surface of microelectrodes

• Main Authors: LEE SIYEON, KIM JONGWON
• Format: Patent
• Language: English; Korean
• Published: 13.09.2022
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MEASURING; METALLURGY; NANOTECHNOLOGY; PERFORMING OPERATIONS; PHYSICS; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TESTING; TRANSPORTING

The present invention relates to a method for forming nanoporous gold on the surfaces of microelectrodes and, more particularly, to a method for forming nanoporous gold on the surfaces of microelectrodes. The method comprises the steps of: preparing a rod-shaped gold electrode having a diameter of 50 μm or less; immersing the gold electrode in an electrolyte solution containing chlorine ions; and scanning the gold electrode while applying, a potential from a start potential to an end potential to the gold electrode in the electrolyte solution containing the chlorine ions at a rate of 10 mVs^-1 or less. Therefore, the method can form a nanoporous gold structure on the surfaces of microelectrodes in a short time and in a simple way. In addition, the microelectrodes having the nanoporous structures with a large surface area can be applied to various electrochemical investigations and analyses. 본 발명은 미세 전극 표면에 나노다공성 금 형성방법에 관한 것으로, 구체적으로 직경이 50 ㎛ 이하인 로드형태의 금 전극을 준비하는 단계; 상기 금 전극을 염소이온을 포함한 전해질 용액에 침지하는 단계; 상기 금 전극에 염소이온을 포함한 전해질 용액에서 10 mVs-1 이하의 속도로 시작 전위에서 종결 전위까지 전위를 인가하며 스캔하는 단계;를 포함하는 미세 전극 표면에 나노다공성 금 형성방법을 제공한다. 본 발명에 따르면, 짧은 시간에 간단한 방법으로 초미세 전극 표면에 나노다공성 금 구조를 형성할 수 있는 효과가 있다. 본 발명에 따라 표면적이 큰 나노다공성 구조가 형성된 초미세 전극은 다양한 전기화학적 조사 및 분석에 응용될 수 있는 장점이 있다.