VACUUM EXHAUST METHOD AND VACUUM EXHAUST SYSTEM

• Main Authors: HOZUMI TAKASHI, SASAKI SHINICHIRO, SHIOKAWA ATSUSHI
• Format: Patent
• Language: English; Korean
• Published: 02.09.2022
• Subjects: BASIC ELECTRIC ELEMENTS; BLASTING; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; HEATING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LIGHTING; MECHANICAL ENGINEERING; METALLURGY; POSITIVE DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; WEAPONS

Provided is a vacuum evacuation method for solving problems associated with the introduction of an inert gas while suppressing the generation of by-products. The evacuation method includes: a raising step of raising the rotation speed of a vacuum pump device (DP) to a predetermined stable speed after activating the vacuum pump device (DP); and a gas introduction step of introducing an inert gas into the vacuum pump device (DP) after the rotation speed of the vacuum pump device (DP) reaches a stable speed. 부생성물의 생성을 억제하면서, 불활성 가스의 도입에 수반하는 문제를 해결 할 수 있는 진공 배기 방법이 제공된다. 진공 배기 방법은, 진공 펌프 장치(DP)를 기동한 후, 진공 펌프 장치(DP)의 회전 속도를 소정의 안정 속도까지 상승시키는 상승 공정과, 진공 펌프 장치(DP)의 회전 속도가 안정 속도에 도달한 후에, 불활성 가스를 진공 펌프 장치(DP)에 도입하는 가스 도입 공정을 포함한다.