금속 기재 처리 시스템 및 방법

• Main Authors: POST GORDON L, MARTIN JUSTIN J, IBRAHIM ABDULRAHMAN D, MAYO MICHAEL A
• Format: Patent
• Language: Korean
• Published: 25.08.2022
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

0.001 g/ℓ 내지 20 g/ℓ의 양으로 3가 크로뮴을 포함하는 전환 조성물 및 암모늄-함유 화합물을 포함하는 밀봉 조성물을 포함하는 금속 기재 처리 시스템이 개시된다. 또한, 기재 표면의 적어도 일부를 전환 조성물과 접촉시키는 단계 후 기재 표면의 적어도 일부를 밀봉 조성물과 접촉시키는 단계를 포함하는 금속 기재를 처리하는 방법이 개시된다. 또한, 시스템으로 처리하여 얻을 수 있고/있거나 처리 방법에 의해 얻을 수 있는 기재가 개시된다. Disclosed is a system for treating a metal substrate comprising a conversion composition comprising trivalent chromium in an amount of 0.001 g/L to 20 g/L and a sealing composition comprising an ammonium-containing compound. Also disclosed is a method for treating a metal substrate that includes contacting at least a portion of a surface of the substrate with the conversion composition and then contacting at least a portion of the surface of the substrate with the sealing composition. Also disclosed is a substrate obtainable by treatment with the system and/or obtainable by the method of treatment.