CHEMICAL SOLUTION USED FOR CLEANING OR ETCHING RUTHENIUM-CONTAINING LAYER AND METHOD FOR FABRICATING RUTHENIUM WIRING

Provided are: a chemical solution used for cleaning or etching a ruthenium-containing layer, which is capable of obtaining a ruthenium-containing layer with reduced surface roughness while maintaining a good etching rate against ruthenium; and a method for manufacturing ruthenium wiring using the ch...

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Bibliographic Details
Main Authors TAKAHASHI KAZUHIRO, WADA YUKIHISA, KOGA SHINYA
Format Patent
LanguageEnglish
Korean
Published 10.08.2022
Subjects
ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES
BASIC ELECTRIC ELEMENTS
CANDLES
CHEMISTRY
DETERGENT COMPOSITIONS
DETERGENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FATTY ACIDS THEREFROM
METALLURGY
RECOVERY OF GLYCEROL
RESIN SOAPS
SEMICONDUCTOR DEVICES
SOAP OR SOAP-MAKING
USE OF SINGLE SUBSTANCES AS DETERGENTS
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Summary:Provided are: a chemical solution used for cleaning or etching a ruthenium-containing layer, which is capable of obtaining a ruthenium-containing layer with reduced surface roughness while maintaining a good etching rate against ruthenium; and a method for manufacturing ruthenium wiring using the chemical solution. The chemical solution according to the present invention comprises: orthoperiodic acid (A); a basic component (B); and a compound (C) selected from the group consisting of a nitrogen-containing heterocyclic compound, an organic phosphonic acid, and an organic carboxylic acid. (과제) 루테늄에 대한 양호한 에칭 레이트를 유지하면서, 표면 러프니스가 저감된 루테늄 함유층을 얻을 수 있는, 루테늄 함유층을 세정 또는 에칭하기 위해서 사용되는 약액, 및 당해 약액을 사용한 루테늄 배선의 제조 방법을 제공한다. (해결 수단) 오르토과요오드산 (A) 와, 염기 성분 (B) 와, 함질소 복소 고리 화합물, 유기 포스폰산, 및 유기 카르복실산으로 이루어지는 군에서 선택되는 화합물 (C) 를 포함하는, 루테늄 함유층을 세정 또는 에칭하기 위해서 사용되는 약액을 사용한다.
Bibliography:Application Number: KR20220007284