TUNGSTEN OXIDE SINTERED BODY SPUTTERING TARGET AND OXIDE THIN FILM

• Main Authors: JANG BONGJUNG, LEE HYOWON, YANG SEUNGHO, PARK JAESOUNG, HWANG BYUNGJIN, LEE SEUNGYI
• Format: Patent
• Language: English; Korean
• Published: 16.06.2022
• Subjects: ARTIFICIAL STONE; CEMENTS; CERAMICS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS; CONCRETE; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LIME, MAGNESIA; METALLURGY; REFRACTORIES; SLAG; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TREATMENT OF NATURAL STONE

본 발명은 텅스텐 산화물 소결체, 상기 소결체를 포함하는 스퍼터링 타겟 및 이로부터 형성된 산화물 박막을 제공한다. 본 발명에서는 난(難)소결성 텅스텐 산화물에 특정 (준)금속 산화물을 소정 범위로 첨가함으로써, 무가압 소결을 실시하더라도 소결성 개선과 고밀도 특성을 동시에 확보할 수 있다.