FILM MANUFACTURING SYSTEM AND FILM MANUFACTURING METHOD

• Main Authors: UENO TOSHIAKI, OTA TOMOYUKI, SHINAGAWA MASASHI
• Format: Patent
• Language: English; Korean
• Published: 25.05.2022
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; CHEMISTRY; COMPOSITIONS BASED THEREON; GENERAL PROCESSES OF COMPOUNDING; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; PERFORMING OPERATIONS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; THEIR PREPARATION OR CHEMICAL WORKING-UP; TRANSPORTING; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL; WORKING-UP

A film manufacturing system (1) includes a molding device (2) for molding a molten resin into a sheet-shaped substrate (S); a coating device (3) for applying a coating liquid to the surface of the molded substrate (S); a second stretching device (4B) for stretching the substrate coated with the coating liquid; and an infrared thermography device (8) for measuring a temperature of the surface of the substrate (S) from the coating device (3) toward the stretching device (4B) over the entire width direction (TD) of the substrate (S). According to the present invention, non-coated parts can be detected. 필름의 제조 시스템(1)은 용융 수지를 시트 형상의 기재(S)로 성형하는 성형 장치(2)와, 성형된 기재(S)의 표면에 도공액을 도포하는 도공 장치(3)와, 도공액이 도포된 기재를 연신하는 제 2 연신 장치(4B)와, 도공 장치(3)로부터 제 2 연신 장치(4B)로 향하는 기재(S)의 표면의 온도를 기재(S)의 폭 방향(TD) 전부에 걸쳐 측정하는 적외선 서모그래피 장치(8)를 구비한다.