Semiconductor device and semiconductor apparatus comprising the same

A ferroelectric semiconductor device including ferroelectrics and having two or more electrode layers is provided. The semiconductor device may include a first electrode layer and a second electrode layer having a thermal expansion coefficient smaller than that of a ferroelectric layer. A difference...

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Bibliographic Details
Main Authors LEE, YUN SEONG, HEO, JIN SEONG, BAE, HAG YOUL, JO, SANG HYUN, NAM, SEUNG GEOL, MOON, TAE HWAN
Format Patent
LanguageEnglish
Korean
Published 11.05.2022
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Summary:A ferroelectric semiconductor device including ferroelectrics and having two or more electrode layers is provided. The semiconductor device may include a first electrode layer and a second electrode layer having a thermal expansion coefficient smaller than that of a ferroelectric layer. A difference in thermal expansion coefficient between the second electrode layer and the ferroelectric may be greater than a difference in thermal expansion coefficient between the first electrode layer and the ferroelectric. The second electrode layer may have a greater thickness than the first electrode layer. 강유전(ferroelectrics)을 포함하고, 2층 이상의 전극층을 갖는 강유전 반도체 소자가 제공된다. 반도체 소자는 강유전층보다 작은 열팽창계수를 갖는 제 1 전극층과 제 2 전극층을 포함할 수 있다. 제 2 전극층과 강유전체의 열팽창계수의 차이는 제 1 전극층과 강유전체의 열팽창계수의 차이보다 클 수 있다. 제 2 전극층은 제 1 전극층보다 큰 두께를 가질 수 있다.
Bibliography:Application Number: KR20200186785