Semiconductor device and semiconductor apparatus comprising the same
A ferroelectric semiconductor device including ferroelectrics and having two or more electrode layers is provided. The semiconductor device may include a first electrode layer and a second electrode layer having a thermal expansion coefficient smaller than that of a ferroelectric layer. A difference...
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Main Authors | , , , , , |
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Format | Patent |
Language | English Korean |
Published |
11.05.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A ferroelectric semiconductor device including ferroelectrics and having two or more electrode layers is provided. The semiconductor device may include a first electrode layer and a second electrode layer having a thermal expansion coefficient smaller than that of a ferroelectric layer. A difference in thermal expansion coefficient between the second electrode layer and the ferroelectric may be greater than a difference in thermal expansion coefficient between the first electrode layer and the ferroelectric. The second electrode layer may have a greater thickness than the first electrode layer.
강유전(ferroelectrics)을 포함하고, 2층 이상의 전극층을 갖는 강유전 반도체 소자가 제공된다. 반도체 소자는 강유전층보다 작은 열팽창계수를 갖는 제 1 전극층과 제 2 전극층을 포함할 수 있다. 제 2 전극층과 강유전체의 열팽창계수의 차이는 제 1 전극층과 강유전체의 열팽창계수의 차이보다 클 수 있다. 제 2 전극층은 제 1 전극층보다 큰 두께를 가질 수 있다. |
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Bibliography: | Application Number: KR20200186785 |