3 photomask exposure apparatus and manufacturing method of 3-dimensional semiconductor memory device using them

• Main Authors: KIM WOOSUNG, SEO KI BONG, KIM DONGHWAN, PARK GUNWOO, JEONG JANG HWAN
• Format: Patent
• Language: English; Korean
• Published: 04.05.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The present invention discloses a photomask, an exposure device, and a manufacturing method of a three-dimensional semiconductor memory device using the same. The photomask comprises: a mask substrate; a first mask pattern on the mask substrate; and a refractive index change substrate having a flat...