3 photomask exposure apparatus and manufacturing method of 3-dimensional semiconductor memory device using them

The present invention discloses a photomask, an exposure device, and a manufacturing method of a three-dimensional semiconductor memory device using the same. The photomask comprises: a mask substrate; a first mask pattern on the mask substrate; and a refractive index change substrate having a flat...

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Bibliographic Details
Main Authors KIM WOOSUNG, SEO KI BONG, KIM DONGHWAN, PARK GUNWOO, JEONG JANG HWAN
Format Patent
LanguageEnglish
Korean
Published 04.05.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The present invention discloses a photomask, an exposure device, and a manufacturing method of a three-dimensional semiconductor memory device using the same. The photomask comprises: a mask substrate; a first mask pattern on the mask substrate; and a refractive index change substrate having a flat region on one side of the first mask pattern and a non-flat region disposed on the other side of the first mask pattern and thinner than the flat region. 본 발명은 포토마스크, 노광 장치 및 그를 이용한 3차원 반도체 메모리 소자의 제조 방법을 개시한다. 포토마스크는, 마스크 기판과, 상기 마스크 기판 상의 제 1 마스크 패턴과, 상기 제 1 마스크 패턴의 일측 상의 평탄 영역, 및 상기 제 1 마스크 패턴의 타측 상에 배치되어 상기 평탄 영역보다 얇은 비 평탄 영역을 갖는 굴절률 변화 기판을 포함한다.
Bibliography:Application Number: KR20200140658