ETCHANT COMPOSITION AND MANUFACTURING METHOD OF AN ARRAY SUBSTRATE FOR DISPLAY DEVICE USING THE SAME

The present invention provides an etchant composition comprising ammonium persulfate, a fluorine-containing compound, a chlorine-containing compound, a cyclic amine compound, an inorganic acid, a sulfate, and water, and a method for manufacturing an array substrate for a display device using the sam...

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Bibliographic Details
Main Authors YOON YOUNG JIN, KUK IN SEOL, LEE SUCK JUN, LEE EUN WON, CHO HYEON SU, KIM BEOM SOO
Format Patent
LanguageEnglish
Korean
Published 26.04.2022
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Summary:The present invention provides an etchant composition comprising ammonium persulfate, a fluorine-containing compound, a chlorine-containing compound, a cyclic amine compound, an inorganic acid, a sulfate, and water, and a method for manufacturing an array substrate for a display device using the same. According to the present invention, an etching process becomes simple and productivity thereof can be improved. 본 발명은 과산화이황산암모늄, 함불소 화합물, 함염소 화합물, 고리형 아민 화합물, 무기산, 황산염 및 물을 포함하는 식각액 조성물 및 이를 이용한 표시장치용 어레이 기판의 제조방법을 제공한다.
Bibliography:Application Number: KR20200135222