ETCHANT COMPOSITION AND MANUFACTURING METHOD OF AN ARRAY SUBSTRATE FOR DISPLAY DEVICE USING THE SAME
The present invention provides an etchant composition comprising ammonium persulfate, a fluorine-containing compound, a chlorine-containing compound, a cyclic amine compound, an inorganic acid, a sulfate, and water, and a method for manufacturing an array substrate for a display device using the sam...
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Main Authors | , , , , , |
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Format | Patent |
Language | English Korean |
Published |
26.04.2022
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Subjects | |
Online Access | Get full text |
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Summary: | The present invention provides an etchant composition comprising ammonium persulfate, a fluorine-containing compound, a chlorine-containing compound, a cyclic amine compound, an inorganic acid, a sulfate, and water, and a method for manufacturing an array substrate for a display device using the same. According to the present invention, an etching process becomes simple and productivity thereof can be improved.
본 발명은 과산화이황산암모늄, 함불소 화합물, 함염소 화합물, 고리형 아민 화합물, 무기산, 황산염 및 물을 포함하는 식각액 조성물 및 이를 이용한 표시장치용 어레이 기판의 제조방법을 제공한다. |
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Bibliography: | Application Number: KR20200135222 |