POSITIONING APPARATUS LITHOGRAPHY APPARATUS AND ARTICLE MANUFACTURING METHOD

• Main Author: TERAO TSUTOMU
• Format: Patent
• Language: English; Korean
• Published: 14.04.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The present invention provides a positioning apparatus for positioning an object. The positioning apparatus according to the present invention comprises: a first actuator and a second actuator which are disposed along a first direction to be parallel to each other, and which are configured to allow a beam to be moved in the first direction; a third actuator which is embedded in the beam, and which is configured to allow an object to be moved in a second direction with respect to the beam, wherein the second direction intersects the first direction; and a control unit configured to control the first actuator, the second actuator, and the third actuator. 본 발명은 물체의 위치결정을 위한 위치결정 장치를 제공하며, 위치결정 장치는 서로 평행하게 제1 방향을 따라 배치되고 빔을 제1 방향으로 이동시키도록 구성되는 제1 액추에이터 및 제2 액추에이터, 빔에 내장되고 물체를 빔에 대해 제2 방향으로 이동시키도록 구성되는 제3 액추에이터로서, 제2 방향은 제1 방향과 교차하는, 제3 액추에이터, 및 제1 액추에이터, 제2 액추에이터, 및 제3 액추에이터를 제어하도록 구성되는 제어 유닛을 포함한다.