BLACK PHOTOSENSITIVE RESIN COMPOSITION METHOD OF MANUFACTURING PATTERNED CURED PRODUCT PATTERNED CURED PRODUCT AND BLACK MATRIX

An object of the present invention is to provide a black photosensitive resin composition capable of forming a light-shielding cured product having high solvent resistance even when a baking temperature is low, a method for producing a patterned cured product using the black photosensitive resin com...

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Bibliographic Details
Main Authors SATO AZUMI, SAKATA MAKOTO
Format Patent
LanguageEnglish
Korean
Published 12.04.2022
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Summary:An object of the present invention is to provide a black photosensitive resin composition capable of forming a light-shielding cured product having high solvent resistance even when a baking temperature is low, a method for producing a patterned cured product using the black photosensitive resin composition, a patterned cured product formed from a cured product of the black photosensitive resin composition, and a black matrix formed from the cured product of the black photosensitive resin composition. The black photosensitive resin composition comprises an alkali-soluble resin (A), a specific photo-polymerizable monomer (B), a photo-polymerization initiator (C), and a specific light shielding agent (D). [과제] 베이크 온도가 낮은 경우에도 높은 용제 내성을 가지는 차광성의 경화물을 형성할 수 있는 흑색 감광성 수지 조성물과, 당해 흑색 감광성 수지 조성물을 이용하는 패턴화된 경화물의 제조 방법과, 전술의 흑색 감광성 수지 조성물의 경화물로 이루어지는 패턴화된 경화물과, 전술의 흑색 감광성 수지 조성물의 경화물로 이루어지는 블랙 매트릭스를 제공하는 것. [해결 수단] 알칼리 가용성 수지(A)와, 특정의 광중합성 모노머(B)와, 광중합 개시제(C)와, 특정의 차광제(D)를 포함하는, 흑색 감광성 수지 조성물을 이용한다.
Bibliography:Application Number: KR20210129655