POLISHING COMPOSITION METHOD FOR PRODUCING THE SAME POLISHING METHOD AND METHOD FOR PRODUCING SUBSTRATE

• Main Authors: YOSHIZAKI YUKINOBU, NAGANO TAKAHITO
• Format: Patent
• Language: English; Korean
• Published: 05.04.2022
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMISTRY; DRESSING OR CONDITIONING OF ABRADING SURFACES; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; PERFORMING OPERATIONS; POLISHES; POLISHING; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SEMICONDUCTOR DEVICES; SKI WAXES; TRANSPORTING

An object of the present invention is to provide a means capable of achieving a remarkably high selectivity and a remarkably high step reduction effect between different materials while achieving a high polishing rate for a specific material. A polishing composition according to the present inventio...