ALD POSITION AND TEMPERATURE MONITORING OF ALD PLATEN SUSCEPTOR

• Main Authors: GRIFFIN KEVIN, DZILNO DMITRY A, RAVID ABRAHAM, YUDOVSKY JOSEPH, GANGAKHEDKAR KAUSHAL, MINKOVICH ALEX
• Format: Patent
• Language: English; Korean
• Published: 05.04.2022
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

ALD 플래튼 서셉터의 위치 및 온도 모니터링 상기 서셉터 조립체와 가스 분배 조립체 사이의 갭을 측정하고 제어하는 장치 및 방법이 설명되어 있다. 웨이퍼 이송 목적을 위한 위치 제어 및 온도 제어를 위한 장치 및 방법도 설명되어 있다. Apparatus and methods of measuring and controlling the gap between a susceptor assembly and a gas distribution assembly are described. Apparatus and methods for positional control and temperature control for wafer transfer purposes are also described.