VAPORIZATION SOURCE IN DEPOSITION EQUIPMENT

• Main Author: SONG JUN HWAN
• Format: Patent
• Language: English; Korean
• Published: 31.03.2022
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

An embodiment of the present invention provides a vaporization source which prevents contamination occurring during a filling process of deposition material in deposition equipment. The vaporization source of the deposition equipment according to an embodiment of the present invention comprises: a crucible body which accommodates the deposition material and evaporates the deposition material to a substrate; a heat source which is formed to surround an upper area of the crucible body and heats the deposition material; and a fastening unit which is formed in a lower area of the crucible body and fills the deposition material. According to an embodiment of the present invention, by configuring the fastening unit for filling the deposition material in the lower area of the crucible body in the deposition equipment, contamination due to leakage occurring during the filling process of the deposition material is prevented. 본 발명의 실시예는 증착 설비에서 증착 물질의 충진 과정에서 발생하는 오염을 방지할 수 있는 증발원을 제공한다. 본 발명의 실시예에 따른 증착 설비의 증발원은, 증착 물질을 수용하고 상기 증착 물질을 기판으로 증발시키는 도가니 바디와, 상기 도가니 바디의 상부 영역을 둘러싸도록 형성되어 상기 증착 물질을 가열하는 열원과, 상기 도가니 바디의 하부 영역에 형성되어 상기 증착 물질을 충진하기 위한 체결부를 포함한다. 본 발명의 실시예에 따르면, 증착 설비에서의 도가니 바디의 하부 영역에 증착 물질을 충진하기 위한 체결부를 구성함으로써 증착 물질의 충진 과정에서 발생하는 누설에 의한 오염을 방지할 수 있다.