챔버 컴포넌트 상의 내부식성 막 및 내부식성 막 증착 방법들

• Main Authors: SALY MARK J, ENMAN LISA J, MARCUS STEVEN D, ZHOU LEI
• Format: Patent
• Language: Korean
• Published: 28.03.2022
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

환원되지 않은 금속 표면 상의 금속 산화물의 양과 비교하여, 환원된 금속 표면이 더 적은 금속 산화물을 갖도록, 환원된 금속 표면을 갖는 바디를 포함하는 코팅된 챔버 컴포넌트가 개시된다. 금속 표면은 그 금속 표면 상에 환원성 알코올을 펄싱함으로써 환원될 수 있다. 환원된 금속 표면은, 건식 원자 층 증착 프로세스에 의해, 환원된 금속 표면 상에 증착될 수 있는 내부식성 막으로 코팅될 수 있다. Disclosed is a coated chamber component comprising a body having a reduced metal surface such that the reduced metal surface has less metal oxide as compared to an amount of metal oxide on a metal surface that has not been reduced. The metal surface may be reduced by pulsing a reducing alcohol thereon. The reduced metal surface may be coated with a corrosion resistant film that may be deposited onto the reduced metal surface by a dry atomic layer deposition process.