PHOTOCURABLE RESIN AND PATTERNED BODY MANUFACTURED THEREFROM

A photocurable composition and a patterned body manufactured therefrom are disclosed. The photocurable composition includes a fluorine-based polymerizable monomer, a (meth)acrylate monomer, and a photoinitiator. The photocurable composition can maintain a high level of pattern precision. 광경화성 조성물 및...

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Bibliographic Details
Main Authors PARK JAE HONG, PARK JI YUN, LEE KYUNG HEE, TAK KYUNG SEON, YOON HYUNG GUEN, YU SANG HEE, KANG MIN HYUCK
Format Patent
LanguageEnglish
Korean
Published 04.03.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Summary:A photocurable composition and a patterned body manufactured therefrom are disclosed. The photocurable composition includes a fluorine-based polymerizable monomer, a (meth)acrylate monomer, and a photoinitiator. The photocurable composition can maintain a high level of pattern precision. 광경화성 조성물 및 이로부터 제조된 패턴 형성체가 개시된다.
Bibliography:Application Number: KR20220015676